NanoInstrumentation will focus on two steps of device fabrication that require high resolution: "definition" or "lithography" and "inspection and repair".

The latter is of interest since a production technology is only viable if the products can be calibrated. The challenge for this flagship is to contribute to the solution of the instrumentation problems that limit the production of devices in the sub-20 nm regime.

• The cluster EUV Lithography focuses on the practical resolution limit that can be achieved using Extreme UV lithography (EUV, &labda;˜13 nm); the ultimate limit that can be expected is of the order of the wavelength itself (typically 10 nm). Image enhancement and resist image control are the crucial research subjects in this cluster.
• In the cluster 2-20 nm-Lithography (represented by developments in EBID, IBID and EBL) the challenge is to have more control over the physical and chemical effects that currently put limits on resolution. More specifically the behavior of secondary electrons with respect to resist or precursors is a crucial topic;
• To enable the lithographic techniques mentioned above, the Metrology stages cluster focuses on fast positioning and measuring in 3D space with (sub)-nanometer accuracy.

Flagshipcaptain:
Dr. ir. D. Maas
TNO
TPD, Vestiging Delft